Pre-polysilicon coating of glass substrate

Application Number:	01815870.6	Application date:	2001.08.27
name:	Pre-polysilicon coating of glass substrate
Public (announcement) number:	CN1469848	Public (announcement) day:	2004.01.21
Main classification number:	C03C17/22	The original application number of the division:
Classification number:	C03C17/22; C03C17/34
Award day:		priority:	2000.8.28 US 09/649,724
Application (patent) person:	Applied Materials Ltd.
address:	California
Invention (design) person:	K·S·Lab; D·Medan	International application:	PCT/US01/26668 2001.8.27
International announcement:	WO02/019363 English 2002.3.7	Enter country date:	2003.03.18
Patent agency:	China Council for the Promotion of International Trade Patent and Trademark Office	agent:	Cai Shengyou

Summary
A method and apparatus for forming a polysilicon layer on a pre-annealed glass substrate. In one embodiment, the method comprises: loading a pre-annealed glass substrate in a deposition chamber, depositing an amorphous silicon layer on the pre-annealed glass substrate, and annealing the pre-annealed glass substrate to form a polysilicon layer thereon . The amorphous silicon layer may be deposited while the annealing step is being performed to form a polysilicon layer on the pre-annealed glass substrate. The nitride layer and/or the oxide layer may be deposited prior to depositing the amorphous silicon layer, and the pre-annealed glass substrate is annealed.

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